Device for plasma treatment of materials and powders with 40 kHz source
Device is for plasma surface treatment of materials and powders
- chamber volume - 10 l
- device for powder treatment
- device for planar sample treatment (max. dimensions 10 x 20 cm)
- two carrier gas channels with feed rate regulation
- possibility of monomer bottle connection
- possibility of bubbler bottle connection
- power generator regulation 0-100 W
contact person:
doc. Ing. Marián Lehocký, Ph.D.
+420 57 603 1215 215/U1
+420 608 616 048
+420 57 603 8035 A319
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research
