Device for plasma treatment of materials and powders with microwave 2,45 GHz source

Device is for plasma surface treatment of materials and powders

- chamber volume - 10 l

- device for powder treatment

- device for planar sample treatment (max. dimensions 10 x 20 cm)

- two carrier gas channels with feed rate regulation

- possibility of monomer bottle connection

- possibility of bubbler bottle connection

- power generator regulation 0-100 W

 

contact person:

doc. Ing. Marián Lehocký, Ph.D.

+420 57 603 1215 215/U1
+420 608 616 048
+420 57 603 8035 A319
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research

SURFACE MODIFICATIONS

Dip Coater

Dip Coater

PlasmaBeam DUO PC - Diener electronic GmbH

PlasmaBeam DUO PC - Diener electronic GmbH

Device for plasma treatment of materials and powders with microwave 2,45 GHz source

Device for plasma treatment of materials and powders with microwave 2,45 GHz source

Device for plasma treatment of materials and powders with radiofrequency 13,56 MHz source

Device for plasma treatment of materials and powders with radiofrequency 13,56 MHz source

Device for plasma treatment of materials and powders with 40 kHz source

Device for plasma treatment of materials and powders with 40 kHz source

Sputter coater Quorum Q300 TT

Sputter coater Quorum Q300 TT

Contacts

Management


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